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High polarization and wake-up free ferroelectric characteristics in ultrathin Hf.sub.0.5./sub.Zr.sub.0.5./sub.O.sub.2./sub. devices by control of oxygen-deficient layer

  1. 1.
    SYSNO0553457
    TitleHigh polarization and wake-up free ferroelectric characteristics in ultrathin Hf0.5Zr0.5O2 devices by control of oxygen-deficient layer
    Author(s) Yadav, M. (KR)
    Kashir, Alireza (FZU-D) ORCID
    Oh, S. (KR)
    Nikam, R.D. (KR)
    Kim, H. (KR)
    Jang, H. (KR)
    Hwang, H. (KR)
    Source Title Nanotechnology. Roč. 33, č. 8 (2022). - : Institute of Physics Publishing
    Article number085206
    Document TypeČlánek v odborném periodiku
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryGB
    Keywords interfacial layer * annealing temperature * remnant polarization * sub-5 nm HZO * wakeup free * TEM * XPS
    URLhttps://doi.org/10.1088/1361-6528/ac3a38
    Permanent Linkhttp://hdl.handle.net/11104/0330727
    FileDownloadSizeCommentaryVersionAccess
    0553457AP.pdf11.1 MBAuthor’s postprintopen-access
     
Number of the records: 1  

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