Number of the records: 1
Study of thermal recrystallisation in Si implanted by 0.4-MeV heavy ions
- 1.Mikšová, Romana - Horák, Pavel - Holý, V. - Macková, Anna
Study of thermal recrystallisation in Si implanted by 0.4-MeV heavy ions.
Surface and Interface Analysis. Roč. 51, č. 11 (2019), s. 1113-1120. ISSN 0142-2421. E-ISSN 1096-9918
OECD category: Nuclear physics
Impact factor: 1.665, year: 2019
Method of publishing: Limited access
https://doi.org/10.1002/sia.6698
http://hdl.handle.net/11104/0300721
Number of the records: 1