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Hiding e-beam exposure fields by deterministic 2D pattering
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SYSNO ASEP 0494364 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Hiding e-beam exposure fields by deterministic 2D pattering Author(s) Horáček, Miroslav (UPT-D) RID, ORCID, SAI
Knápek, Alexandr (UPT-D) RID, ORCID, SAI
Matějka, Milan (UPT-D) RID, ORCID, SAI
Krátký, Stanislav (UPT-D) RID, ORCID, SAI
Urbánek, M. (CZ)
Mika, Filip (UPT-D) RID, SAI, ORCID
Kolařík, Vladimír (UPT-D) RID, ORCID, SAINumber of authors 7 Source Title Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar. - Brno : Institute of Scientific Instruments The Czech Academy of Sciences, 2018 - ISBN 978-80-87441-23-7 Pages s. 36-37 Number of pages 2 s. Publication form Print - P Action Recent Trends in Charged Particle Optics and Surface Physics Instrumentation Event date 04.06.2018 - 08.06.2018 VEvent location Skalský dvůr Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords phyllotaxis ; electron beam lithography Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering OECD category Optics (including laser optics and quantum optics) R&D Projects TE01020233 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) TG03010046 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 UT WOS 000450591400012 Annotation The high stability and good current homogeneity in the spot of the e-beam writer is crucial to
the exposure quality, particularly in the case of large-area structures when gray-scale
lithography is used. Even though the deflection field distortion is calibrated regularly and
beam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief.
Recently, we presented a method that makes use of e–beam exposure imperfection by
introducing marginally visible high–frequency diffraction gratings of variable pitch that fill in
separate orthogonal exposure fields. The actually presented approach follows up our
research on aperiodic arrangements of optical primitives, especially on the phyllotactic–
like arrangement of sub–micron relief optical elements. This approach is extended from the
diffraction element arrangement to the higher level of exposure fields arrangements.Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2019
Number of the records: 1