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Hiding e-beam exposure fields by deterministic 2D pattering
- 1.HORÁČEK, M., KNÁPEK, A., MATĚJKA, M., KRÁTKÝ, S., URBÁNEK, M., MIKA, F., KOLAŘÍK, V. Hiding e-beam exposure fields by deterministic 2D pattering. In: Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar. Brno: Institute of Scientific Instruments The Czech Academy of Sciences, 2018, s. 36-37. ISBN 978-80-87441-23-7.
Number of the records: 1