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Treatment of surfaces with slow electrons
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SYSNO ASEP 0460200 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Treatment of surfaces with slow electrons Author(s) Frank, Luděk (UPT-D) RID, SAI, ORCID
Mikmeková, Eliška (UPT-D) RIDNumber of authors 2 Source Title Proceedings of the 15th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. - Brno : Institute of Scientific Instruments CAS, 2016 / Mika Filip - ISBN 978-80-87441-17-6 Pages s. 10-11 Number of pages 2 s. Publication form Print - P Action International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /15./ Event date 29.05.2016 - 03.06.2016 VEvent location Skalský dvůr Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords electron microscopy ; SEM ; STEM Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering R&D Projects TE01020118 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support UPT-D - RVO:68081731 UT WOS 000391254000003 Annotation Historically, the most annoying obstacle to acquiring SEM micrographs, in particular higher magnification micrographs taken with the ambition of resolving the finest observable details, may be said to be carbonaceous contamination “highlighting” the previous field of view with a black rectangle contoured by an even darker frame. This contamination is generated by decomposition of adsorbed hydrocarbon molecules with incident electrons leaving a crosslinked
layer of carbon atoms as a surface coating. The darker contours come from high surface mobility of hydrocarbon molecules from outside the field. The situation has been improved in recent decades by a lower pressure and dryer vacuum in specimen chambers, but even under ultrahigh vacuum (UHV) conditions the phenomenon occurs due to hydrocarbon molecules deposited on the specimen when loaded. Therefore, only in-situ cleaning with an
attachment producing an ion beam solves this problem in UHV, while some plasma cleaners have also started appearing in standard-vacuum SEM chambers. The goal of complete removal of hydrocarbons is motivated by the supposed unavoidability of their decomposition with primary electrons. However, we have found hydrocarbon molecules being released, rather than their decomposition, when the energy of the impinging electrons drops beneath 50 eV or so.Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2017 Electronic address http://www.trends.isibrno.cz/
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