Number of the records: 1
Semiconducting WO.sub.3./sub. thin films prepared by pulsed reactive magnetron sputtering
- 1.0454787 - FZÚ 2016 RIV NL eng J - Journal Article
Brunclíková, M. - Hubička, Zdeněk - Kment, Štěpán - Olejníček, Jiří - Čada, Martin - Kšírová, Petra - Krýsa, J.
Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering.
Research on Chemical Intermediates. Roč. 41, č. 12 (2015), s. 9259-9266. ISSN 0922-6168. E-ISSN 1568-5675.
[Pannonian Symposium on Catalysis /12./. Třešť, 16.09.2014-20.09.2014]
R&D Projects: GA ČR GAP108/12/2104; GA MŠMT LH12043
Grant - others:AVČR(CZ) M100101215
Institutional support: RVO:68378271
Keywords : WO3 * water splitting * HIPIMS * photoanodes
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 1.833, year: 2015
Permanent Link: http://hdl.handle.net/11104/0255434
Number of the records: 1