Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

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SYSNO	0449520
Title	Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
Author(s)	Lundin, D. (FR) Čada, Martin (FZU-D)_{RID, ORCID, SAI} Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Source Title	Plasma Sources Science & Technology. Roč. 24, č. 3 (2015), s. 035018. - : Institute of Physics Publishing
Document Type	Článek v odborném periodiku
Grant	608800, XE - EU countries
	LH12043 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	GB
Keywords	IPVD * HiPIMS * HPPMS * Langmuir probe * ion meter
Permanent Link	http://hdl.handle.net/11104/0251068

Number of the records: 1