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Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
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SYSNO ASEP 0449520 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS Author(s) Lundin, D. (FR)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAISource Title Plasma Sources Science & Technology. - : Institute of Physics Publishing - ISSN 0963-0252
Roč. 24, č. 3 (2015), s. 035018Number of pages 11 s. Language eng - English Country GB - United Kingdom Keywords IPVD ; HiPIMS ; HPPMS ; Langmuir probe ; ion meter Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects LH12043 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 UT WOS 000356857800043 EID SCOPUS 84937554357 DOI 10.1088/0963-0252/24/3/035018 Annotation The ionization of sputtered Ti, Al, and C has been investigated in non-reactive high-power impulse magnetron sputtering discharges using Ar as a process gas. Two complementary techniques, time-resolved Langmuir probe diagnostics and a recently developed gridless ion meter, have for the first time been used to estimate absolute values of the ionized fractions of the sputtered material. It is found that by increasing the current density from 0.5 to 2.0 A cm−2 there is a general increase of ne independently of target material and position in time with maximum plasma densities of about 1 × 1018–5 × 1018 m−3 above the target race track. Also the ionized flux fraction, measured by ion meter, is increased when increasing the current density and reaches a maximum value of 78% in the Al discharge. By using the recorded ne and Te values to calculate the ionization probability of the sputtered material, and benchmark these results using the ion meter. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2016
Number of the records: 1