Number of the records: 1
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
- 1.Lundin, D. - Čada, Martin - Hubička, Zdeněk
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS.
Plasma Sources Science & Technology. Roč. 24, č. 3 (2015), s. 035018. ISSN 0963-0252. E-ISSN 1361-6595
Impact factor: 2.808, year: 2015
http://hdl.handle.net/11104/0251068
Number of the records: 1