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Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
- 1.LUNDIN, D., ČADA, M., HUBIČKA, Z. Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS. Plasma Sources Science & Technology. 2015, 24(3), 035018. ISSN 0963-0252. E-ISSN 1361-6595. Available: doi: 10.1088/0963-0252/24/3/035018
Number of the records: 1