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Response of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser

  1. 1.
    SYSNO0579468
    TitleResponse of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser
    Author(s) Medvedev, Nikita (UFP-V) [LP] ORCID
    Noei, H. (DE)
    Toleikis, S. (DE)
    Ziaja, B. (DE)
    Corespondence/seniorMedvedev, Nikita - Korespondující autor
    Source Title Journal of Chemical Physics. Roč. 154, č. 20 (2021). - : AIP Publishing
    Article number204706
    Document TypeČlánek v odborném periodiku
    Grant LTT17015 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LM2015083 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    CA17126, BE - Belgium
    Institutional supportUFP-V - RVO:61389021
    Languageeng
    CountryUS
    Keywords XUV * graphene * free-electron laser
    Cooperating institutions Deutsches Elektronen-Synchrotron (DESY) (Germany)
    URLhttps://pubs.aip.org/aip/jcp/article-abstract/154/20/204706/200024/Response-of-free-standing-graphene-monolayer?redirectedFrom=fulltext
    Permanent Linkhttps://hdl.handle.net/11104/0348305
     
Number of the records: 1  

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