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Response of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser

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    SYSNO ASEP0579468
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleResponse of free-standing graphene monolayer exposed to ultrashort intense XUV pulse from free-electron laser
    Author(s) Medvedev, Nikita (UFP-V) ORCID
    Noei, H. (DE)
    Toleikis, S. (DE)
    Ziaja, B. (DE)
    Number of authors4
    Article number204706
    Source TitleJournal of Chemical Physics. - : AIP Publishing - ISSN 0021-9606
    Roč. 154, č. 20 (2021)
    Number of pages9 s.
    Languageeng - English
    CountryUS - United States
    KeywordsXUV ; graphene ; free-electron laser
    Subject RIVBH - Optics, Masers, Lasers
    OECD categoryOptics (including laser optics and quantum optics)
    R&D ProjectsLTT17015 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LM2015083 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingLimited access
    Institutional supportUFP-V - RVO:61389021
    UT WOS000692566000003
    EID SCOPUS85106874263
    DOI10.1063/5.0041261
    AnnotationThe response of a free-standing graphene monolayer exposed to a few tens of femtoseconds long extreme ultraviolet (XUV) pulse was studied theoretically in order to analyze and compare contributions of various mechanisms to the graphene damage, understood here as a global atomic disintegration. Our simulation results indicate that nonthermal disintegration of the atomic structure is the predominant damage mechanism for a free-standing graphene layer. Only at high absorbed doses, charge-induced disintegration of the graphene structure prevails. We also demonstrate that the progressing damage can be probed by femtosecond optical pulses in the soft UV regime (4 eV photon energy). The achieved quantitative understanding of the damage mechanisms may enable a better control of graphene-based devices when they are exposed to x-ray radiation, as well as an efficient processing of graphene layers with ultrashort intense XUV pulses.
    WorkplaceInstitute of Plasma Physics
    ContactVladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975
    Year of Publishing2024
    Electronic addresshttps://pubs.aip.org/aip/jcp/article-abstract/154/20/204706/200024/Response-of-free-standing-graphene-monolayer?redirectedFrom=fulltext
Number of the records: 1  

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