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Polydimethylsiloxane as protecting layer to improve the quality of patterns on graphene oxide
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SYSNO 0563456 Title Polydimethylsiloxane as protecting layer to improve the quality of patterns on graphene oxide Author(s) Cutroneo, Mariapompea (UJF-V) [ONF] ORCID, RID, SAI
Havránek, Vladimír (UJF-V) [ONF] RID, SAI, ORCID
Torrisi, L. (IT)
Macková, Anna (UJF-V) [ONF] RID, ORCID, SAI
Malinský, Petr (UJF-V) [ONF] RID, ORCID, SAI
Fazio, B. (IT)
Slepička, P. (CZ)
Fajstavr, D. (CZ)
Silipigni, L. (IT)Corespondence/senior Cutroneo, Mariapompea - Korespondující autor Source Title Vacuum. Roč. 204, OCT (2022). - : Elsevier Article number 111353 Document Type Článek v odborném periodiku Grant EF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA22-10536S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic Institutional support UJF-V - RVO:61389005 Language eng Country GB Keywords graphene oxide * Polydimethylsiloxane * ion lithography * deoxgenation * structural modification Cooperating institutions Univerzita Jana Evangelisty Purkyně v Ústí nad Labem. Přírodovědecká fakulta (Czech Republic)
Vysoká škola chemicko-technologická v Praze (Czech Republic)URL https://doi.org/10.1016/j.vacuum.2022.111353 Permanent Link https://hdl.handle.net/11104/0335413
Number of the records: 1