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Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering
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SYSNO 0552187 Title Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering Author(s) Mukhopadhyay, A.K. (IN)
Roy, A. (IN)
Bhattacharjee, G. (IN)
Das, S.C. (IN)
Majumdar, A. (IN)
Wulff, H. (DE)
Hippler, Rainer (FZU-D) ORCIDCorespondence/senior Hippler, Rainer - Korespondující autor Source Title Materials. Roč. 14, č. 12 (2021). - : MDPI Article number 3191 Document Type Článek v odborném periodiku Institutional support FZU-D - RVO:68378271 Language eng Country CH Keywords magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy URL http://hdl.handle.net/11104/0327392 Permanent Link http://hdl.handle.net/11104/0327392 File Download Size Commentary Version Access 0552187.pdf 2 5.6 MB CC Licence Publisher’s postprint open-access
Number of the records: 1