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Methods of the electron induced cleanning in SEM
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SYSNO ASEP 0551132 Document Type A - Abstract R&D Document Type O - Ostatní Title Methods of the electron induced cleanning in SEM Author(s) Müllerová, Ilona (UPT-D) RID, SAI, ORCID
Konvalina, Ivo (UPT-D) RID, ORCID, SAI
Materna Mikmeková, Eliška (UPT-D) ORCID, RID, SAISource Title Microscopy and Microanalysis. - : Cambridge University Press - ISSN 1431-9276
Roč. 27, S1 (2021), s. 2016-2017Number of pages 2 s. Publication form Online - E Language eng - English Country US - United States Keywords SEM ; contamination ; electron beam cleaning ; graphene Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering OECD category Electrical and electronic engineering Institutional support UPT-D - RVO:68081731 DOI 10.1017/S1431927621007327 Annotation A special technique was developed and tested to clean the specimen and to do the imaging of the individual graphene layers, or other 2D materials, in the standard vacuum conditions of the conventional SEM. Parameters such as the primary electron beam energy, electron dose, sample bias, and scanning rate have been optimized to find the equilibrium between electron stimulated desorption (cleaning) and deposition (contamination). Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2022 Electronic address https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/methods-of-the-electron-induced-cleanning-in-sem/54D0340450B8B0BEA7DAD306BCE1C21B
Number of the records: 1