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Laser and ion beams graphene oxide reduction for microelectronic devices
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SYSNO ASEP 0523925 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Laser and ion beams graphene oxide reduction for microelectronic devices Author(s) Torrisi, L. (IT)
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Torrisi, Alfio (UJF-V) RID, ORCID
Cutroneo, Mariapompea (UJF-V) ORCID, RID, SAI
Silipigni, L. (IT)Number of authors 5 Source Title Radiation Effects and Defects in Solids. - : Taylor & Francis - ISSN 1042-0150
Roč. 175, 3-4 (2020), s. 226-240Number of pages 15 s. Publication form Print - P Language eng - English Country GB - United Kingdom Keywords Graphene oxide ; ion beam reduction ; lithography ; laser ; ion beam ; electronic device Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects LM2015056 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) EF16_013/0001812 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA19-02482S GA ČR - Czech Science Foundation (CSF) Method of publishing Limited access Institutional support UJF-V - RVO:61389005 UT WOS 000522130000002 EID SCOPUS 85082713888 DOI 10.1080/10420150.2019.1701456 Annotation Reduced graphene oxide (rGO) is a two-dimensional material, which is attracting increasing attention due to its special properties. It can be obtained by laser or ion beam irradiations of pristine graphene oxide (GO). It shows high mechanical resistance, considerable electric and thermal conductivity. All these rGO characteristics together with the high number of molecular species that can be embedded between its layers, make graphene oxide a potential material for electronic sensors or efficient support on which conductive strips, condensers, and micrometric electronic devices can be designed. In particular, as it is described in this paper, it is possible to carry out high spatial resolution lithography in GO by using a focused laser or micro ion beam in order to design macro, micro, and submicron geometrical structures. The use of the reduced graphene oxide for the laser and ion beam fabrication of electrical resistances and capacitances is presented. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2021 Electronic address https://doi.org/10.1080/10420150.2019.1701456
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