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Electrical probe diagnostics of the hollow cathode plasma jet system for deposition of TiO.sub.x./sub. thin films
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SYSNO ASEP 0309887 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Electrical probe diagnostics of the hollow cathode plasma jet system for deposition of TiOx thin films Title Sondová diagnostika plazmového tryskového systému s efektem duté katody pro depozice tenkých vrstev TiOx. Author(s) Virostko, Petr (FZU-D)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Čada, Martin (FZU-D) RID, ORCID, SAI
Adámek, Petr (FZU-D) RID, ORCID
Kment, Štěpán (FZU-D) RID, ORCID
Tichý, M. (CZ)
Jastrabík, Lubomír (FZU-D) RID, ORCIDSource Title Contributions to Plasma Physics. - : Wiley - ISSN 0863-1042
Roč. 48, 5-7 (2008), s. 527-533Number of pages 7 s. Language eng - English Country DE - Germany Keywords hollow cathode ; plasma jet ; probe diagnostics ; deposition of thin films Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GA202/06/0776 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) AV0Z10100521 - FZU-D (2005-2011) UT WOS 000258126900024 DOI 10.1002/ctpp.200810085 Annotation Measurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Time-resolved Langmuir probe technique was simultaneously used to observe the basic plasma properties during the ion flux measurements. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2009
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