Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

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SYSNO	0574018
Title	Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
Author(s)	Romanenko, Oleksandr V. (UJF-V) [ONF]_{ORCID, SAI} Lavrentiev, Vasyl (UJF-V) [ONF]_{RID, ORCID, SAI} Borodkin, Andrei (URE-Y) Havránek, Vladimír (UJF-V) [ONF]_{RID, SAI, ORCID} Macková, Anna (UJF-V) [ONF]_{RID, ORCID, SAI}
Source Title	Nuclear Instruments & Methods in Physics Research Section B. Roč. 538, MAY (2023), s. 123-130. - : Elsevier
Document Type	Článek v odborném periodiku
Grant	EF18_053/0017163 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	UJF-V - RVO:61389005 ; URE-Y - RVO:67985882
Language	eng
Country	NL
Keywords	PMMA shrinkage * Ion beam lithography * Microstructuring * Diffraction grating
URL	https://doi.org/10.1016/j.nimb.2023.02.001
Permanent Link	https://hdl.handle.net/11104/0344381

Number of the records: 1