Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

Romanenko, Oleksandr V.; Lavrentiev, Vasyl; Borodkin, Andrei; Havránek, Vladimír; Macková, Anna

doi:https://dx.doi.org/10.1016/j.nimb.2023.02.001

Number of the records: 1

Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

1.

SYSNO ASEP	0574018
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film
Author(s)	Romanenko, Oleksandr V. (UJF-V)_{ORCID, SAI} Lavrentiev, Vasyl (UJF-V)_{RID, ORCID, SAI} Borodkin, Andrei (URE-Y) Havránek, Vladimír (UJF-V)_{RID, SAI, ORCID} Macková, Anna (UJF-V)_{RID, ORCID, SAI}
Number of authors	5
Source Title	Nuclear Instruments & Methods in Physics Research Section B. - : Elsevier - ISSN 0168-583X Roč. 538, MAY (2023), s. 123-130
Number of pages	8 s.
Publication form	Print - P
Language	eng - English
Country	NL - Netherlands
Keywords	PMMA shrinkage ; Ion beam lithography ; Microstructuring ; Diffraction grating
OECD category	Nuclear physics
R&D Projects	EF18_053/0017163 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Method of publishing	Limited access
Institutional support	UJF-V - RVO:61389005 ; URE-Y - RVO:67985882
UT WOS	001027901300001
EID SCOPUS	85150335122
DOI	10.1016/j.nimb.2023.02.001
Annotation	The present work focuses on the shrinkage of PMMA films under irradiation and its application to the creation of optical devices. We prepared the free-standing PMMA films in four different thicknesses (13, 21, 32, and 43 & mu,m), and PMMA films of the same thickness, but deposited on a glass substrate. A diffraction grating was chosen as the optical device to show the applicability of the method. The study revealed that at a film thickness of 13-32 & mu,m, the shrinkage of the free-standing film increases proportionally to its thickness, while the film on the substrate does not have a pronounced dependence. Films with the thickness of 43 & mu,m do not follow this trend. It was found that under the same irradiation conditions, the film on the substrate shrinks more compared to the free-standing film. Interference patterns from the created diffraction gratings were shown to present spurious illumination areas.
Workplace	Nuclear Physics Institute
Contact	Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228
Year of Publishing	2024
Electronic address	https://doi.org/10.1016/j.nimb.2023.02.001

Number of the records: 1