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InSe:Ge-doped InSe van der Waals heterostructure to enhance photogenerated carrier separation for self-powered photoelectrochemical-type photodetectors
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SYSNO ASEP 0563785 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title InSe:Ge-doped InSe van der Waals heterostructure to enhance photogenerated carrier separation for self-powered photoelectrochemical-type photodetectors Author(s) Liao, L. (CZ)
Wu, B. (CZ)
Kovalska, E. (CZ)
Oliveira, F.M. (CZ)
Azadmanjiri, J. (CZ)
Mazánek, V. (CZ)
Valdman, L. (CZ)
Spejchalova, L. (CZ)
Xu, C.Y. (CN)
Levinský, Petr (FZU-D) RID, ORCID
Hejtmánek, Jiří (FZU-D) RID, ORCID
Sofer, Z. (CZ)Number of authors 12 Source Title Nanoscale. - : Royal Society of Chemistry - ISSN 2040-3364
Roč. 14, č. 14 (2022), s. 5412-5424Number of pages 13 s. Language eng - English Country GB - United Kingdom Keywords indium selenide ; 2D materials ; photoelectrochemical measurements Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GA18-12761S GA ČR - Czech Science Foundation (CSF) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000772122400001 EID SCOPUS 85127656929 DOI 10.1039/d1nr07150e Annotation Two-dimensional (2D) van der Waals (vdW) materials with tunable heterostructures and superior optoelectronic properties have opened a new platform for various applications, e.g., field-effect transistors, ultrasensitive photodetectors and photocatalysts. In this work, an InSe/InSe(Ge) (germanium doped InSe) vdW heterostructure is designed to improve the photoresponse performance of sole InSe in a photoelectrochemical (PEC)-type photodetector. Photoelectrochemical measurements demonstrated that this heterostructure has excellent photoresponse characteristics, including a photocurrent density of 9.8 μA cm-2, a photo-responsivity of 64 μA W-1, and a response time/recovery time of 0.128 s/0.1 s. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2023 Electronic address https.//doi.org/10.1039/d1nr07150e
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