Number of the records: 1
Towards an ideal high-κ HfO.sub.2./sub.–ZrO.sub.2./sub.-based dielectric
- 1.
SYSNO 0556440 Title Towards an ideal high-κ HfO2–ZrO2-based dielectric Author(s) Kashir, Alireza (FZU-D) ORCID
Farahani, M.G. (CA)
Hwang, H. (KR)Corespondence/senior Kashir, Alireza - Korespondující autor Source Title Nanoscale. Roč. 13, č. 32 (2021), s. 13631-13640. - : Royal Society of Chemistry Document Type Článek v odborném periodiku Institutional support FZU-D - RVO:68378271 Language eng Country GB Keywords dielectric properties of solids * electric fields * electronics industry * ferroelectric films * ferroelectricity * Hafnium oxides * Zirconia URL https://doi.org Permanent Link http://hdl.handle.net/11104/0330666
Number of the records: 1