Towards an ideal high-κ HfO.sub.2./sub.–ZrO.sub.2./sub.-based dielectric

KASHIR, Alireza, FARAHANI, M.G., HWANG, H. Towards an ideal high-κ HfO₂–ZrO₂-based dielectric. Nanoscale. 2021, 13(32), 13631-13640. ISSN 2040-3364. E-ISSN 2040-3372. Available: doi: 10.1039/d1nr02272e.