Efficient photochemical vapor generation of bismuth using a coiled Teflon reactor: Effect of metal sensitizers and analytical performance with flame-in-gas-shield atomizer and atomic fluorescence spectrometry

0539789 - ÚIACH 2022 RIV US eng J - Journal Article
Vyhnanovský, Jaromír - Yildiz, D. - Štádlerová, Barbora - Musil, Stanislav
Efficient photochemical vapor generation of bismuth using a coiled Teflon reactor: Effect of metal sensitizers and analytical performance with flame-in-gas-shield atomizer and atomic fluorescence spectrometry.
Microchemical Journal. Roč. 164, MAY (2021), č. článku 105997. ISSN 0026-265X. E-ISSN 1095-9149
R&D Projects: GA ČR(CZ) GJ19-17604Y
Institutional support: RVO:68081715
Keywords : bismuth * photochemical vapor generation * atomic spectrometry
OECD category: Analytical chemistry
Impact factor: 5.304, year: 2021
Method of publishing: Limited access

Photochemical vapor generation (PVG) of bismuth was accomplished in a simple flow–injection system with a standard Hg low-pressure tube lamp and a coiled Teflon reactor. The use of various metals as sensitizers was studied to initiate and enhance PVG substantially.
Permanent Link: http://hdl.handle.net/11104/0317494