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Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
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SYSNO 0533965 Title Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering Author(s) Hajihoseini, H. (IS)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Ünaldi, S. (FR)
Raadu, M.A. (SE)
Brenning, N. (FR)
Gudmundsson, J.T. (IS)
Lundin, D. (FR)Source Title Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 38, č. 3 (2020), s. 1-11. - : AIP Publishing Article number 033009 Document Type Článek v odborném periodiku Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic GA19-00579S GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Language eng Country US Keywords plasma * ion flux * HiPIMS * sputtering URL https://doi.org/10.1116/1.5145292 Permanent Link http://hdl.handle.net/11104/0312189
Number of the records: 1