Number of the records: 1  

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

  1. 1.
    SYSNO ASEP0533965
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleSideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
    Author(s) Hajihoseini, H. (IS)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Ünaldi, S. (FR)
    Raadu, M.A. (SE)
    Brenning, N. (FR)
    Gudmundsson, J.T. (IS)
    Lundin, D. (FR)
    Number of authors8
    Article number033009
    Source TitleJournal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. - : AIP Publishing - ISSN 0734-2101
    Roč. 38, č. 3 (2020), s. 1-11
    Number of pages11 s.
    Languageeng - English
    CountryUS - United States
    Keywordsplasma ; ion flux ; HiPIMS ; sputtering
    Subject RIVBL - Plasma and Gas Discharge Physics
    OECD categoryFluids and plasma physics (including surface physics)
    R&D ProjectsEF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA19-00579S GA ČR - Czech Science Foundation (CSF)
    Method of publishingLimited access
    Institutional supportFZU-D - RVO:68378271
    UT WOS000529407100003
    EID SCOPUS85084281981
    DOI10.1116/1.5145292
    AnnotationThe sideways (radial) deposition rate and ionized flux fraction in a high power impulse magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron sputtering (dcMS) discharge, while the magnetic field strength and degree of balancing are varied.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2021
    Electronic addresshttps://doi.org/10.1116/1.5145292
Number of the records: 1  

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