Number of the records: 1
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
- 1.
SYSNO ASEP 0533965 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering Author(s) Hajihoseini, H. (IS)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Ünaldi, S. (FR)
Raadu, M.A. (SE)
Brenning, N. (FR)
Gudmundsson, J.T. (IS)
Lundin, D. (FR)Number of authors 8 Article number 033009 Source Title Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. - : AIP Publishing - ISSN 0734-2101
Roč. 38, č. 3 (2020), s. 1-11Number of pages 11 s. Language eng - English Country US - United States Keywords plasma ; ion flux ; HiPIMS ; sputtering Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA19-00579S GA ČR - Czech Science Foundation (CSF) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000529407100003 EID SCOPUS 85084281981 DOI 10.1116/1.5145292 Annotation The sideways (radial) deposition rate and ionized flux fraction in a high power impulse magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron sputtering (dcMS) discharge, while the magnetic field strength and degree of balancing are varied. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2021 Electronic address https://doi.org/10.1116/1.5145292
Number of the records: 1