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Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
SYS 0533965 LBL 01000a^^22220027750^450 005 20240103224644.8 014 $a 85084281981 $2 SCOPUS 014 $a 000529407100003 $2 WOS 017 70
$a 10.1116/1.5145292 $2 DOI 100 $a 20201104d m y slo 03 ba 101 0-
$a eng 102 $a US 200 1-
$a Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering 215 $a 11 s. 463 -1
$1 001 cav_un_epca*0257155 $1 011 $a 0734-2101 $e 1520-8559 $1 200 1 $a Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films $v Roč. 38, č. 3 (2020), s. 1-11 $1 210 $c AIP Publishing 608 $a Article 610 $a plasma 610 $a ion flux 610 $a HiPIMS 610 $a sputtering 700 -1
$3 cav_un_auth*0386963 $a Hajihoseini $b H. $y IS 701 -1
$3 cav_un_auth*0100168 $a Čada $b Martin $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0100245 $a Hubička $b Zdeněk $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0386964 $a Ünaldi $b S. $y FR 701 -1
$3 cav_un_auth*0386965 $a Raadu $b M.A. $y SE 701 -1
$3 cav_un_auth*0386966 $a Brenning $b N. $y FR 701 -1
$3 cav_un_auth*0386967 $a Gudmundsson $b J.T. $y IS 701 -1
$3 cav_un_auth*0302435 $a Lundin $b D. $y FR 856 $u https://doi.org/10.1116/1.5145292 $9 RIV
Number of the records: 1