Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

Hajihoseini, H., Čada, M., Hubička, Z., Ünaldi, S., Raadu, M.A., Brenning, N., Gudmundsson, J.T., Lundin, D. Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. 2020, 38(3), 1-11), 033009. ISSN 0734-2101. E-ISSN 1520-8559. Available: doi: 10.1116/1.5145292.