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Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
- 1.HAJIHOSEINI, H., ČADA, M., HUBIČKA, Z., ÜNALDI, S., RAADU, M.A., BRENNING, N., GUDMUNDSSON, J.T., LUNDIN, D. Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering. Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. 2020, 38(3), 1-11), 033009. ISSN 0734-2101. E-ISSN 1520-8559. Available: doi: 10.1116/1.5145292.
Number of the records: 1