Laser system for measuring MEMS relief created by the method of deep reactive ion etching

Number of the records: 1

1.

SYSNO	0498736
Title	Laser system for measuring MEMS relief created by the method of deep reactive ion etching
Author(s)	Maňka, Tadeáš (UPT-D)_{RID, ORCID, SAI} Šerý, Mojmír (UPT-D)_{RID, SAI} Krátký, Stanislav (UPT-D)_{RID, ORCID, SAI} Zemánek, Pavel (UPT-D)_{RID, SAI, ORCID}
Source Title	21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics. (Proceedings of SPIE 10976). - Bellingham : SPIE, 2018 / Zemánek Pavel
Conference	Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics /21./, 03.09.2018 - 07.09.2018, Lednice
Article number	109760M
Document Type	Konferenční příspěvek (zahraniční konf.)
Grant	LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
	ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	UPT-D - RVO:68081731
Language	eng
Country	US
Keywords	laser interferometry * DRIE * MEMS * depth measuring
Permanent Link	http://hdl.handle.net/11104/0291094

Number of the records: 1