Laser system for measuring MEMS relief created by the method of deep reactive ion etching

Maňka, T., Šerý, M., Krátký, S., Zemánek, P. Laser system for measuring MEMS relief created by the method of deep reactive ion etching. In: ZEMÁNEK, Pavel, ed. 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics. (Proceedings of SPIE 10976). Bellingham: SPIE, 2018, č. článku 109760M. ISBN 9781510626072. ISSN 0277-786X. Available: doi: 10.1117/12.2518098