Number of the records: 1

SMV-2017-23: Optimalizace nanolitografie

SYSNO ASEP	0483025
Document Type	V - Research Report
R&D Document Type	V - Research Report
Title	SMV-2017-23: Optimalizace nanolitografie
Title	SMV-2017-23: Optimization of nanolitography
Author(s)	Jákl, Petr (UPT-D)_{RID, ORCID, SAI} Šerý, Mojmír (UPT-D)_{RID, SAI}
Number of authors	2
Issue data	Brno: Ústav experimentálnej fyziky SAV, 2017
Number of pages	2 s.
Publication form	Print - P
Language	cze - Czech
Country	CZ - Czech Republic
Keywords	two photon photopolymerization ; laser beam shaping
Subject RIV	BH - Optics, Masers, Lasers
OECD category	Optics (including laser optics and quantum optics)
Next source	Non-public resources
Annotation	Zlepšení rozlišení dvoufotonové fotopolymerace pomocí odstranění optických aberací a optimalizace ohniska laserového svazku.
Description in English	Two-photon photopolymerization technique was improved by decreasing optical aberrations and optimization of laser beam.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2018

Number of the records: 1