Number of the records: 1  

Etching of polymers, proteins and bacterial spores by atmospheric pressure DBD plasma in air

  1. 1.
    SYSNO ASEP0475063
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleEtching of polymers, proteins and bacterial spores by atmospheric pressure DBD plasma in air
    Author(s) Kuzminova, A. (CZ)
    Kretková, T. (CZ)
    Kylián, O. (CZ)
    Hanuš, J. (CZ)
    Khalakhan, I. (CZ)
    Prukner, Václav (UFP-V) RID, ORCID
    Doležalová, Eva (UFP-V) RID
    Šimek, Milan (UFP-V) RID, ORCID
    Biederman, H. (CZ)
    Article number135201
    Source TitleJournal of Physics D-Applied Physics. - : Institute of Physics Publishing - ISSN 0022-3727
    Roč. 50, č. 13 (2017)
    Number of pages11 s.
    Publication formPrint - P
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsdielectric barrier discharges (DBD) ; bio-decontamination ; etching ; polymers ; biomolecules ; spores ; surface treatment
    Subject RIVBL - Plasma and Gas Discharge Physics
    OECD categoryFluids and plasma physics (including surface physics)
    R&D ProjectsLD13010 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportUFP-V - RVO:61389021
    UT WOS000395934300001
    EID SCOPUS85015207200
    DOI10.1088/1361-6463/aa5c21
    AnnotationOne of the key processes that leads to a desired result is plasma etching and thus the evaluation of etching rates of organic materials is of high importance. We report here on the systematic study of the etching of nine different common polymers that mimic the different structures of more complicated biological systems, bovine serum albumin (BSA) selected as the model protein and spores of Bacillus subtilis taken as a representative of highly resistant micro-organisms. The treatment of these materials was performed by means of atmospheric pressure DBD sustained in open air at constant conditions. All tested polymers, BSA and spores, were readily etched by DBD plasma. However, the measured etching rates were found to be dependent on the chemical structure of treated materials, namely on the presence of oxygen in the structure of polymers.
    WorkplaceInstitute of Plasma Physics
    ContactVladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975
    Year of Publishing2018
Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.