Measurements of current density distribution in shaped e-beam writers

Bok, Jan; Horáček, Miroslav; Kolařík, Vladimír; Urbánek, Michal; Matějka, Milan; Krzyžánek, Vladislav

doi:https://dx.doi.org/10.1016/j.mee.2015.09.013

Number of the records: 1

Measurements of current density distribution in shaped e-beam writers

1.

SYSNO ASEP	0454665
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Measurements of current density distribution in shaped e-beam writers
Author(s)	Bok, Jan (UPT-D)_RID Horáček, Miroslav (UPT-D)_{RID, ORCID, SAI} Kolařík, Vladimír (UPT-D)_{RID, ORCID, SAI} Urbánek, Michal (UPT-D)_RID Matějka, Milan (UPT-D)_{RID, ORCID, SAI} Krzyžánek, Vladislav (UPT-D)_{RID, ORCID, SAI}
Number of authors	6
Source Title	Microelectronic Engineering. - : Elsevier - ISSN 0167-9317 Roč. 149, JAN 5 (2016), s. 117-124
Number of pages	8 s.
Publication form	Print - P
Language	eng - English
Country	NL - Netherlands
Keywords	shaped e-beam writer ; electron beam ; current density
Subject RIV	JB - Sensors, Measurment, Regulation
R&D Projects	GA14-20012S GA ČR - Czech Science Foundation (CSF)
	LO1212 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	UPT-D - RVO:68081731
UT WOS	000367420200021
EID SCOPUS	84944145588
DOI	10.1016/j.mee.2015.09.013
Annotation	In this paper, we present four measurement methods for the two-dimensional mapping of the current density distribution in variable-shaped e-beam writers. All the methods use only the native equipment of the e-beam writer which provides the advantage of relatively easy implementation. The first and second measurement methods are based on the knife-edge technique in which the e-beam is scanned in two directions across a Faraday cup opening and across shaping shutters of the forming system, respectively. In the thirdmethod, a phosphor screen is irradiated by a magnified e-beam spot and the current density distribution is represented by the luminescence image on the screen. The fourth method uses electron sensitive resist which is exposed by the e-beam. The developed resist is observed under a microscope and the current density distribution is judged fromthe resist profile. All the methods are demonstrated in an example, compared, and their spatial resolution and accuracy evaluated.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2016

Number of the records: 1