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On X-ray diffraction study of microstructure of ZnO thin nanocrystalline films with strong preferred grain orientation
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SYSNO ASEP 0396259 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title On X-ray diffraction study of microstructure of ZnO thin nanocrystalline films with strong preferred grain orientation Author(s) Kužel, R. (CZ)
Čížek, J. (CZ)
Novotný, Michal (FZU-D) RID, ORCID, SAINumber of authors 3 Source Title Metallurgical and Materials Transactions A. - : Springer - ISSN 1073-5623
44A, č. 1 (2013), s. 45-57Number of pages 13 s. Language eng - English Country US - United States Keywords zinc oxide thin film ; X-ray diffraction ; Mg0 ; fused silica Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GAP108/11/0958 GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 UT WOS 000313718500009 DOI 10.1007/s11661-012-1432-x Annotation Textures, stresses, and strains, as well as the overall so-called real structure, are crucial for properties of thin films deposited by different methods and can have both positive and negative effects depending on the film and its application. They were studied by a combination of different X-ray diffraction (XRD) techniques for several ZnO films. The films prepared by pulsed laser deposition (PLD) on MgO and sapphire single-crystalline substrates and amorphous-fused silica showed different kinds of strong preferred orientation and also different stresses that could be estimated only from the analysis of quite narrow, nonzero intensity regions of diffraction spots. XRD line broadening was analyzed by a combination of different asymmetric scans. Fiber (0001) texture and tensile residual stresses were found on fused silica, while domains with local epitaxy and huge compressive ... Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2014
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