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Effect of pressure on behavior of anode attachment of dc arc plasma torch

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    0374713 - ÚFP 2012 RIV US eng J - Journal Article
    Chumak, Oleksiy - Kopecký, Vladimír - Konrád, Miloš - Kavka, Tetyana - Hrabovský, Milan
    Effect of pressure on behavior of anode attachment of dc arc plasma torch.
    [Vliv tlaku na vlastnosti anodového připojení oblouku plazmatronu.]
    High Temperature Materials and Processes. Roč. 9, č. 3 (2005), s. 391-400. ISSN 1093-3611. E-ISSN 1940-4360
    Institutional research plan: CEZ:AV0Z20430508
    Keywords : arc anode * dc arc jet * anode restrike * low pressure
    Subject RIV: BL - Plasma and Gas Discharge Physics
    Impact factor: 0.136, year: 2005

    Anode attachment region of dc arc in hybrid argon/water plasma torch was studied at different ambient pressures. Anode region was photographed by CCD camera and voltage fluctuations, caused by anode attachment movement in a restrike mode, were measured by high frequency voltage dividers. The velocity of downstream movement of anode attachment increased with the reduction of pressure and the position of the attachment was shifted counter-stream-wise. The amplitude as well as the frequency of saw-tooth voltage fluctuations was reduced with decreasing pressure. For ambient pressures lower than 30 kPa the constricted anode attachment was not observed and the anode region has diffuse character. The change of anode attachment regime coincides with change of character of the jet flow from subsonic to supersonic. The measured dependences are explained by changes in the sheath between the plasma jet and the anode surface.

    Oblast anodového připojení u hybridního plazmatronu s kombinací argonové a vodní stabilizace byla zkoumána v závislosti na tlaku okolního prostředí. Proud plazmatu byl sledován CCD kamerou a pomocí děličů byly měřeny fluktuace obloukového napětí. Rychlost pohybu anodového připojení roste s klesajícím tlakem, amplituda pilového průběhu napětí klesá. Od tlaku 30 kPa má připojení difuzní charakter a proudění se mění na nadzvukové. Uvedené chování je dáno změnami ve vrstvě mezi proudem plazmatu a povrchem anody.
    Permanent Link: http://hdl.handle.net/11104/0207567

     
     
Number of the records: 1  

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