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Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD
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SYSNO ASEP 0134067 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD Author(s) Lančok, Ján (FZU-D) RID, ORCID
Novotný, Michal (FZU-D) RID, ORCID, SAI
Bulíř, Jiří (FZU-D) RID, ORCID, SAI
Jelínek, Miroslav (FZU-D) RID, ORCID
Zelinger, Zdeněk (UFCH-W) RID, ORCIDISBN 0-8194-4528-2 Source Title Advanced Laser Technologies. - Bellingham : SPIE International Society for Optical Engineering, 2002 / Dimitras D.C. ; Dinescu M. ; Konov V.I. - ISSN 0277-786X Pages s. 118-124 Number of pages 7 s. Action ALT'01 International Conference on Advanced Laser Technologies Event date 11.09.2001-14.09.2001 VEvent location Constanta Country RO - Romania Event type WRD Language eng - English Country US - United States Keywords carbon nitride thin films ; PLD ; RF discharge Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z1010914 - FZU-D Annotation Nitrogen-rich carbon nitride films were prepared by pulsed laser deposition combined with additional r.f. and hollow cathode discharge on fused silica, stainless steel and silicon substrates. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2003
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