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Chemical vapor deposition of diamond films on qcm substrates
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SYSNO ASEP 0575295 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Chemical vapor deposition of diamond films on qcm substrates Author(s) Kromka, Alexander (FZU-D) RID, ORCID, SAI
Kočí, Michal (FZU-D) ORCID
Szabó, Ondrej (FZU-D) ORCID, RID
Aubrechtová Dragounová, Kateřina (FZU-D) ORCID
Vanko, G. (SK)
Izsák, T. (SK)
Varga, M. (SK)Number of authors 7 Source Title Proceedings of ADEPT - ADEPT 2023. - Žilina : University of Žilina, 2023 / Jandura D. ; Lettrichová I. ; Kováč, jr. J. - ISBN 978-80-554-1977-0 Pages s. 157-160 Number of pages 4 s. Publication form Online - E Action International Conference on Advances in Electronic and Photonic Technologies /11./ - ADEPT 2023 Event date 12.06.2023 - 15.06.2023 VEvent location Podbanské Country SK - Slovakia Event type EUR Language eng - English Country SK - Slovakia Keywords diamond ; quartz crystal microbalance ; microwave plasma CVD ; sensor Subject RIV JB - Sensors, Measurment, Regulation OECD category Materials engineering R&D Projects LM2023051 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 Annotation The quartz crystal microbalance (QCM) represents an acoustic (mass) analytical platform suitable for the detection of gases and biomolecules in air and liquid, respectively. Several studies have shown that the sensing performance, sensitivity, and selectivity of QCMs are further enhanced by using an appropriate functional layer. Among others, diamond is one such attractive material thanks to its extraordinary properties. However, the use of standard CVD diamond growth procedures at 800 °C cannot be applied to the QCM substrate due to its low phase transition temperature (570 °C). An alternative solution here offers a low- temperature (400 °C) linear antenna microwave plasma. In this work, we demonstrate technological progress in diamond growth on QCM substrates in terms of maintaining their functionality and the ability to cover both sides in one deposition cycle due to the low pressure (<15 mbar) and placement of the QCM substrate in the so-called cold plasma region. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2024
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