High rate deposition of photoactive TiO.sub.2./sub. films by hot hollow cathode

Olejníček, Jiří; Šmíd, Jiří; Čada, Martin; Kšírová, Petra; Kohout, Michal; Perekrestov, Roman; Tvarog, D.; Kment, Štěpán; Kmentová, H.; Hubička, Zdeněk

doi:https://dx.doi.org/10.1016/j.surfcoat.2019.125256

Number of the records: 1

High rate deposition of photoactive TiO.sub.2./sub. films by hot hollow cathode

1.

SYSNO ASEP	0524998
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	High rate deposition of photoactive TiO₂ films by hot hollow cathode
Author(s)	Olejníček, Jiří (FZU-D)_{RID, ORCID} Šmíd, Jiří (FZU-D) Čada, Martin (FZU-D)_{RID, ORCID, SAI} Kšírová, Petra (FZU-D)_{RID, ORCID} Kohout, Michal (FZU-D)_{RID, ORCID} Perekrestov, Roman (FZU-D) Tvarog, D. (CZ) Kment, Štěpán (FZU-D)_{RID, ORCID} Kmentová, H. (CZ) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Number of authors	10
Article number	125256
Source Title	Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972 Roč. 383, Feb (2020), s. 1-10
Number of pages	10 s.
Language	eng - English
Country	CH - Switzerland
Keywords	TiO₂ ; hollow cathode discharge ; sputtering ; thermal evaporation ; deposition rate
Subject RIV	BL - Plasma and Gas Discharge Physics
OECD category	Fluids and plasma physics (including surface physics)
R&D Projects	EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	EF16_013/0001406 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA17-20008S GA ČR - Czech Science Foundation (CSF)
Method of publishing	Limited access
Institutional support	FZU-D - RVO:68378271
UT WOS	000509617000018
EID SCOPUS	85076290354
DOI	10.1016/j.surfcoat.2019.125256
Annotation	In this paper we present a plasma deposition technique that allows the reactive deposition of oxide layers with extremely high deposition rate. The new approach combines reactive sputtering by DC hollow cathode discharge with thermal evaporation from the hot surface of the hollow cathode. As an example of successful fast deposition, photoactive films of titanium dioxide (TiO2) with various thicknesses were deposited using this technique. The uncooled titanium nozzle served as a hot hollow cathode and simultaneously as an inert gas (Ar) inlet. The reactive gas (O2) was introduced into the vacuum chamber through a separate inlet. During deposition, the temperature of the titanium hollow cathode reached up to 1600 °C, depending on the discharge parameters. This made it possible to combine the ion sputtering of hot titanium cathode with its thermal surface evaporation, which significantly increased the TiO2 deposition rate. The highest achieved deposition rate was 567 nm/min (34 μm/h), which (with respect to the geometry of this process) corresponds to total volume of the deposited TiO2 material 1.2 mm3/min per 1 kW of absorbed power. Despite extremely high thermal flux to the substrate, TiO2 films were successfully deposited even on temperature-sensitive PET foil. The as-deposited and post-annealed TiO2 films prepared on fluorine doped tin oxide (FTO) substrates and glass were subject to further analyses including X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM) and photoelectrochemical (PEC) measurements. Whereas the as-deposited TiO2 films had an amorphous (or nearly amorphous) structure, which exhibited only weak photoactivity, after annealing their PEC activity increased by an order of magnitude.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2021
Electronic address	https://doi.org/10.1016/j.surfcoat.2019.125256

Number of the records: 1