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Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

  1. 1.
    SYSNO0497873
    TitleDamage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
    Author(s) Makhotkin, I.A. (NL)
    Milov, I. (NL)
    Chalupský, Jaromír (FZU-D) RID, ORCID
    Tiedtke, K. (DE)
    Enkisch, H. (DE)
    de Vries, G. (NL)
    Scholze, F. (DE)
    Siewert, F. (DE)
    Sturm, J.M. (NL)
    Nikolaev, K. (NL)
    van de Kruijs, R.W.E. (NL)
    Smithers, M.A. (NL)
    van Wolferen, H.A.G.M. (NL)
    Keim, E.G. (NL)
    Louis, E. (NL)
    Jacyna, I. (PL)
    Jurek, M. (PL)
    Klinger, D. (PL)
    Pelka, J. B. (PL)
    Juha, Libor (FZU-D) RID, ORCID, SAI
    Hájková, Věra (FZU-D) RID, ORCID
    Vozda, Vojtěch (FZU-D) ORCID
    Burian, Tomáš (FZU-D) RID, ORCID
    Saksl, Karel (FZU-D)
    Faatz, B. (DE)
    Keitel, B. (DE)
    Ploenjes, E. (DE)
    Schreiber, S. (DE)
    Toleikis, S. (DE)
    Loch, R. (DE)
    Hermann, M. (DE)
    Strobel, S. (DE)
    Donker, R. (NL)
    Mey, T. (DE)
    Sobierajski, R. (PL)
    Source Title Journal of the Optical Society of America. B. Roč. 35, č. 11 (2018), s. 2799-2805. - : Optical Society of America
    Document TypeČlánek v odborném periodiku
    Grant GA17-05167s GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
    LG15013 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA14-29772S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryUS
    Keywords interaction of femtosecond XUV pulses * single-shot ablation threshold * damage accumulation in thin ruthenium films
    Permanent Linkhttp://hdl.handle.net/11104/0290344
     
Number of the records: 1  

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