Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

Makhotkin, I.A.; Milov, I.; Chalupský, Jaromír; Tiedtke, K.; Enkisch, H.; de Vries, G.; Scholze, F.; Siewert, F.; Sturm, J.M.; Nikolaev, K.; van de Kruijs, R.W.E.; Smithers, M.A.; van Wolferen, H.A.G.M.; Keim, E.G.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Pelka, J. B.; Juha, Libor; Hájková, Věra; Vozda, Vojtěch; Burian, Tomáš; Saksl, Karel; Faatz, B.; Keitel, B.; Ploenjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Donker, R.; Mey, T.; Sobierajski, R.

doi:https://dx.doi.org/10.1364/JOSAB.35.002799

Number of the records: 1

Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold

1.

SYSNO ASEP	0497873
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
Author(s)	Makhotkin, I.A. (NL) Milov, I. (NL) Chalupský, Jaromír (FZU-D)_{RID, ORCID} Tiedtke, K. (DE) Enkisch, H. (DE) de Vries, G. (NL) Scholze, F. (DE) Siewert, F. (DE) Sturm, J.M. (NL) Nikolaev, K. (NL) van de Kruijs, R.W.E. (NL) Smithers, M.A. (NL) van Wolferen, H.A.G.M. (NL) Keim, E.G. (NL) Louis, E. (NL) Jacyna, I. (PL) Jurek, M. (PL) Klinger, D. (PL) Pelka, J. B. (PL) Juha, Libor (FZU-D)_{RID, ORCID, SAI} Hájková, Věra (FZU-D)_{RID, ORCID} Vozda, Vojtěch (FZU-D)_ORCID Burian, Tomáš (FZU-D)_{RID, ORCID} Saksl, Karel (FZU-D) Faatz, B. (DE) Keitel, B. (DE) Ploenjes, E. (DE) Schreiber, S. (DE) Toleikis, S. (DE) Loch, R. (DE) Hermann, M. (DE) Strobel, S. (DE) Donker, R. (NL) Mey, T. (DE) Sobierajski, R. (PL)
Number of authors	35
Source Title	Journal of the Optical Society of America. B. - : Optical Society of America - ISSN 0740-3224 Roč. 35, č. 11 (2018), s. 2799-2805
Number of pages	7 s.
Publication form	Print - P
Language	eng - English
Country	US - United States
Keywords	interaction of femtosecond XUV pulses ; single-shot ablation threshold ; damage accumulation in thin ruthenium films
Subject RIV	BH - Optics, Masers, Lasers
OECD category	Optics (including laser optics and quantum optics)
R&D Projects	GA17-05167s GA ČR - Czech Science Foundation (CSF)
	LG15013 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA14-29772S GA ČR - Czech Science Foundation (CSF)
Institutional support	FZU-D - RVO:68378271
UT WOS	000448941700021
EID SCOPUS	85056121487
DOI	10.1364/JOSAB.35.002799
Annotation	The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg (FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shot damage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditions justifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible for multi-shot damage in optical coatings.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2019

Number of the records: 1