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Ion-beam lithography: A promising technique for the patterning of graphene oxide foil
- 1.0495721 - ÚJF 2019 RIV US eng C - Conference Paper (international conference)
Cutroneo, Mariapompea - Havránek, Vladimír - Macková, Anna - Malinský, Petr - Torrisi, L. - Perez-Hernandez, J. A. - Roso, L. - Luxa, J. - Sofer, Z. - Bottger, R.
Ion-beam lithography: A promising technique for the patterning of graphene oxide foil.
AIP Conference Proceedings. Vol. 2011. Melville: AIP Publishing, 2018, č. článku 090007. ISBN 978-0-7354-1727-4. ISSN 0094-243X.
[17th International Conference on Ion Sources. Geneva (CH), 15.09.2017-20.09.2017]
R&D Projects: GA MŠMT LM2015056; GA ČR GA16-05167S; GA MŠMT EF16_013/0001812
Institutional support: RVO:61389005
Keywords : graphene oxide foil * ion beam lithography * deoxygenation
OECD category: Nuclear physics
Permanent Link: http://hdl.handle.net/11104/0288651
Number of the records: 1