Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

Pokorný, D.; Novotný, Michal; Musil, Jindřich; Fitl, Přemysl; Bulíř, Jiří; Lančok, Ján

doi:https://dx.doi.org/10.1002/ppap.201200145

Number of the records: 1

Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

1.

SYSNO ASEP	0397579
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases
Author(s)	Pokorný, D. (DE) Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Musil, Jindřich (FZU-D)_{RID, ORCID} Fitl, Přemysl (FZU-D)_{RID, ORCID} Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI} Lančok, Ján (FZU-D)_{RID, ORCID}
Source Title	Plasma Processes and Polymers. - : Wiley - ISSN 1612-8850 Roč. 10, č. 7 (2013), s. 593-602
Number of pages	10 s.
Language	eng - English
Country	DE - Germany
Keywords	double charge ions ; mass spectrometry ; noble gas ; RF magnetron discharges ; silver ; single charge ions
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	GAP108/11/1298 GA ČR - Czech Science Foundation (CSF)
	GAP108/11/1312 GA ČR - Czech Science Foundation (CSF)
	GAP108/11/0958 GA ČR - Czech Science Foundation (CSF)
Institutional support	FZU-D - RVO:68378271
UT WOS	000322371700002
DOI	10.1002/ppap.201200145
Annotation	The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and Ag++ were found in the RF discharges; here X=Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2014

Number of the records: 1