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Mass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases

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    SYSNO ASEP0397579
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleMass spectrometric characterizations of ions generated in RF magnetron discharges during sputtering of silver in Ne, Ar, Kr and Xe gases
    Author(s) Pokorný, D. (DE)
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Musil, Jindřich (FZU-D) RID, ORCID
    Fitl, Přemysl (FZU-D) RID, ORCID
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Lančok, Ján (FZU-D) RID, ORCID
    Source TitlePlasma Processes and Polymers. - : Wiley - ISSN 1612-8850
    Roč. 10, č. 7 (2013), s. 593-602
    Number of pages10 s.
    Languageeng - English
    CountryDE - Germany
    Keywordsdouble charge ions ; mass spectrometry ; noble gas ; RF magnetron discharges ; silver ; single charge ions
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGAP108/11/1298 GA ČR - Czech Science Foundation (CSF)
    GAP108/11/1312 GA ČR - Czech Science Foundation (CSF)
    GAP108/11/0958 GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271
    UT WOS000322371700002
    DOI10.1002/ppap.201200145
    AnnotationThe article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X+, Ag+, (XAg)+, X2+, Ag2+, X++ and Ag++ were found in the RF discharges; here X=Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2014
Number of the records: 1  

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