Number of the records: 1  

Effect of solution conductivity on H2O2 production by pulsed corona discharge in water

  1. 1.
    SYSNO ASEP0315463
    Document TypeA - Abstract
    R&D Document TypeThe record was not marked in the RIV
    R&D Document TypeNení vybrán druh dokumentu
    TitleEffect of solution conductivity on H2O2 production by pulsed corona discharge in water
    Author(s) Lukeš, Petr (UFP-V) RID, ORCID
    Člupek, Martin (UFP-V) RID
    Babický, Václav (UFP-V) RID
    Šunka, Pavel (UFP-V) RID
    Tothová, I. (CZ)
    Janda, V. (CZ)
    Source TitleIEEE Conference Records – Abstracts, ICOPS 2008, The 35th IEEE international Conference on Plasma Science. - Piscataway : IEEE Operations Center, 2008 - ISSN 0730-9244
    S. 426-426
    Number of pages1 s.
    Publication formUSB FLASH - USB FLASH
    ActionIEEE International Conference on Plasma Science - ICOPS 2008 /35./
    Event date15.06.2008-19.06.2008
    VEvent locationKarlsruhe
    CountryDE - Germany
    Event typeEUR
    Languageeng - English
    CountryUS - United States
    Keywordscorona discharge ; water ; hydrogen peroxide
    Subject RIVBL - Plasma and Gas Discharge Physics
    R&D ProjectsIAAX00430802 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z20430508 - UFP-V (2005-2011)
    AnnotationHydrogen peroxide as the most abundant chemical species directly produced by the discharge in water is often utilized in Fenton's reaction to increase the plasmachemical efficiency of the removal of organic compounds by addition of ferrous salts into treated water. There is also evidence about contribution of H2O2 in bacterial inactivation by electrical discharge in water. In the present study, the role of solution conductivity in the hydrogen peroxide production by the pulsed corona discharge in water generated using point to plane geometry of electrodes is investigated. The free radical scavenging property of DMSO and KBr is used to determine the initial rate of formation of H2O2 by the pulsed corona discharge. The influence of UV radiation of the discharge and the effect of H2 on the production of hydrogen peroxide will be discussed.
    WorkplaceInstitute of Plasma Physics
    ContactVladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975
    Year of Publishing2009
Number of the records: 1  

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