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Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering

  1. 1.
    SYSNO0133760
    TitleComposition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
    Author(s) Shaginyan, L. R. (UA)
    Mišina, Martin (FZU-D)
    Zemek, Josef (FZU-D) RID, ORCID
    Musil, Jindřich (FZU-D) RID, ORCID
    Regent, F. (CZ)
    Britun, V. F. (UA)
    Source Title Thin Solid Films. Roč. 408, - (2002), s. 136-147. - : Elsevier
    Document TypeČlánek v odborném periodiku
    Grant GV106/96/K245 GA ČR - Czech Science Foundation (CSF)
    GA106/99/D086 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z1010914 - FZU-D
    Languageeng
    CountryNL
    Keywords hardness * sputtering * nitrides * alloys
    Permanent Linkhttp://hdl.handle.net/11104/0031719
     

Number of the records: 1  

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