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Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
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SYSNO ASEP 0133760 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering Author(s) Shaginyan, L. R. (UA)
Mišina, Martin (FZU-D)
Zemek, Josef (FZU-D) RID, ORCID
Musil, Jindřich (FZU-D) RID, ORCID
Regent, F. (CZ)
Britun, V. F. (UA)Source Title Thin Solid Films. - : Elsevier - ISSN 0040-6090
Roč. 408, - (2002), s. 136-147Number of pages 12 s. Language eng - English Country NL - Netherlands Keywords hardness ; sputtering ; nitrides ; alloys Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GV106/96/K245 GA ČR - Czech Science Foundation (CSF) GA106/99/D086 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z1010914 - FZU-D Annotation W-Ti-N films were deposited by the reactive d.c. magnetron sputtering from W-Ti(30 at.) target in a mixture of argon and nitrogen at a total pressure of 0.5 Pa onto steel and silicon substrates. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2003
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