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In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
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SYSNO 0390588 Title In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film Author(s) Novotný, Michal (FZU-D) RID, ORCID, SAI
Bulíř, Jiří (FZU-D) RID, ORCID, SAI
Lančok, Ján (FZU-D) RID, ORCID
Pokorný, P. (CZ)
Piksová, K. (CZ)
Fekete, Ladislav (FZU-D) RID, ORCID
Musil, Jindřich (FZU-D) RID, ORCID
Čekada, M. (CZ)Source Title The 8th Asian - European International Conference on Plasma Surface Engineering. AEPSE 2011. 216 O-101. - Dalian : AJC PSE, EJC PISE, 2011 / Lei M.K. Conference AEPSE 2011. The 8th Asian - European International Conference on Plasma Surface Engineering, Dalian, 19.09.2011-22.09.2011 Document Type Abstrakt Grant GAP108/11/1298 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic GAP108/11/0958 GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic MEB091125 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic GP202/09/P324 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) Language eng Country CN Keywords silver * magnetron sputtering * in-situ monitoring * plasma characterization Permanent Link http://hdl.handle.net/11104/0219453
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