In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film

Novotný, Michal; Bulíř, Jiří; Lančok, Ján; Pokorný, P.; Piksová, K.; Fekete, Ladislav; Musil, Jindřich; Čekada, M.

Number of the records: 1

In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film

1.

SYSNO ASEP	0390588
Document Type	A - Abstract
R&D Document Type	Není vybrán druh dokumentu
Title	In-situ monitoring of the influence of inert gases (Ne, Ar, Kr, Xe) on plasma properties and the growth of magnetron sputtered nanostructured silver thin film
Author(s)	Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI} Lančok, Ján (FZU-D)_{RID, ORCID} Pokorný, P. (CZ) Piksová, K. (CZ) Fekete, Ladislav (FZU-D)_{RID, ORCID} Musil, Jindřich (FZU-D)_{RID, ORCID} Čekada, M. (CZ)
Source Title	The 8th Asian - European International Conference on Plasma Surface Engineering. AEPSE 2011. - Dalian : AJC PSE, EJC PISE, 2011 / Lei M.K. 216 O-101
Number of pages	1 s.
Action	AEPSE 2011. The 8th Asian - European International Conference on Plasma Surface Engineering
Event date	19.09.2011-22.09.2011
VEvent location	Dalian
Country	CN - China
Event type	WRD
Language	eng - English
Country	CN - China
Keywords	silver ; magnetron sputtering ; in-situ monitoring ; plasma characterization
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	GAP108/11/1298 GA ČR - Czech Science Foundation (CSF)
	GAP108/11/0958 GA ČR - Czech Science Foundation (CSF)
	MEB091125 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GP202/09/P324 GA ČR - Czech Science Foundation (CSF)
CEZ	AV0Z10100522 - FZU-D (2005-2011)
Annotation	Ultrathin nanostructured silver films exhibit unusual properties and performances. Functional properties of the film depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions, which are in the case of RF magnetron sputtering closely related to plasma parameters. The sputtering process and the film growth are significantly influenced by the mass ratio of deposited atoms and sputtering gas ions. Deposition conditions promoting the growth of nanostructured film can be established via varying plasma parameters, i.e. mass, energy and flux of atoms and ions impinging the substrate and the ratio of atoms and ions.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2013

Number of the records: 1