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Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition
- 1.0047572 - ÚJF 2007 RIV CZ eng H - Proceedings (Czech conference)
Zajíčková, L. - Buršíková, V. - Sťahel, P. - Buršík, Jiří - Peřina, Vratislav - Macková, Anna - Dubroka, A.
Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition.
[Depozice organosilikonových tenkých vrstev pomocí PECVD.]
Pardubice: Univerzita Pardubice, 2006. 4 s.
[International Conference of Solid State Chemistry /7./. Pardubice (CZ), 24.09.2006-29.09.2006]
Institutional research plan: CEZ:AV0Z10480505; CEZ:AV0Z20410507
Keywords : organosilicon polymers * PECVD * surface analyses
Subject RIV: BL - Plasma and Gas Discharge Physics
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Permanent Link: http://hdl.handle.net/11104/0138433
Number of the records: 1