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Design of Setup for Laser Induced Plasma Etching
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SYSNO ASEP 0617414 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Design of Setup for Laser Induced Plasma Etching Author(s) Šilhan, Lukáš (UPT-D)
Novotný, Jan (UPT-D) ORCID, SAI, RID
Plichta, Tomáš (UPT-D) ORCID, SAI
Ježek, Jan (UPT-D) RID, ORCID, SAI
Vaculík, Ondřej (UPT-D)
Šerý, Mojmír (UPT-D) RID, SAINumber of authors 6 Source Title 2024 37th International Vacuum Nanoelectronics Conference, IVNC 2024. - New York : IEEE, 2024 - ISSN 2164-2370 - ISBN 979-8-3503-7977-8 Pages s. 44-45 Series International Vacuum Nanoelectronics Conference Number of pages 2 s. Publication form Print - P Action International Vacuum Nanoelectronics Conference (IVNC) /37./ Event date 15.07.2024 - 19.07.2024 VEvent location Brno Country CZ - Czech Republic Event type WRD Language eng - English Country US - United States Keywords vacuum chamber ; plasma etching ; femtosecond laser ; micromachining ; three-dimensional displays ; lithography ; electronics industry ; surface emitting lasers ; ignition Subject RIV BH - Optics, Masers, Lasers OECD category Optics (including laser optics and quantum optics) R&D Projects TN02000020 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) Institutional support UPT-D - RVO:68081731 UT WOS 001310530600005 EID SCOPUS 85204066231 DOI https://doi.org/10.1109/IVNC63480.2024.10652276 Annotation Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top of the etched surfaces. This is usually achieved by electron beam lithography, which adds to the complexity and financial demands of the overall process. We present the design of a setup for maskless plasma etching, which utilizes a tightly focused ultrashort laser pulse for the ignition of etching plasma in a custom vacuum chamber with a connection to a gas-containing etching species. In addition, etched structures are written into the surface of sample by scanning with the vacuum chamber with relation to fixed laser focus. This enables maskless 3D etching of samples with a less complicated technological process. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2025 Electronic address https://ieeexplore.ieee.org/document/10652276
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