Highly Efficient Bulk-Crystal-Sized Exfoliation of 2D Materials under Ultrahigh Vacuum

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SYSNO	0585020
Title	Highly Efficient Bulk-Crystal-Sized Exfoliation of 2D Materials under Ultrahigh Vacuum
Author(s)	Haider, Golam (UFCH-W)_{ORCID, RID} Gastaldo, Michele (UFCH-W) Karim, Bazlul (UFCH-W) Plšek, Jan (UFCH-W)_{RID, ORCID} Varade, V. (CZ) Volochanskyi, Oleksandr (UFCH-W)_{ORCID, SAI} Vejpravová, J. (CZ) Kalbáč, Martin (UFCH-W)_{RID, ORCID}
Corespondence/senior	Kalbáč, Martin - Korespondující autor
Source Title	ACS Applied Electronic Materials. (2024). - : American Chemical Society
Document Type	Článek v odborném periodiku
Grant	GX20-08633X GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
Institutional support	UFCH-W - RVO:61388955
Language	eng
Country	US
Keywords	raman-scattering * shear * ultrahigh vacuum exfoliation * noble metals * large-area monolayers * interfacial interaction * Raman spectroscopy
Cooperating institutions	Leibniz Inst Solid State & Mat Res Dresden, Inst Met Mat, D-01069 Dresden, Germany Charles Univ Prague, Fac Math & Phys, Dept Condensed Matter Phys, Prague 12116 2, Czech Republic Univ Chem & Technol Prague, Fac Chem Engn, Dept Phys Chem, Prague 14200, Czech Republic
URL	https://pubs.acs.org/doi/10.1021/acsaelm.3c01824?src=getftr
Permanent Link	https://hdl.handle.net/11104/0352789

Number of the records: 1